Invention Grant
- Patent Title: Photoelectric conversion device, solid-state imaging device and manufacturing method of solid-state imaging device
- Patent Title (中): 光电转换装置,固态成像装置以及固态成像装置的制造方法
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Application No.: US11730434Application Date: 2007-04-02
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Publication No.: US07750423B2Publication Date: 2010-07-06
- Inventor: Daisuke Yokoyama
- Applicant: Daisuke Yokoyama
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2006-100627 20060331
- Main IPC: H01L27/142
- IPC: H01L27/142

Abstract:
A photoelectric conversion device comprising a lower electrode, an upper electrode opposing to the lower electrode and a photoelectric conversion layer provided between the lower electrode and the upper electrode, the photoelectric conversion device being for collecting a photocurrent upon application of a bias voltage between the lower electrode and the upper electrode, wherein the upper electrode works as an electrode in a light incident side, the upper electrode is transparent, and the lower electrode is a metallic electrode having a function to reflect light.
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