Invention Grant
US07750644B2 System with multi-location arc threshold comparators and communication channels for carrying arc detection flags and threshold updating
有权
具有多位置弧度阈值比较器的系统和用于承载电弧检测标志和阈值更新的通信通道
- Patent Title: System with multi-location arc threshold comparators and communication channels for carrying arc detection flags and threshold updating
- Patent Title (中): 具有多位置弧度阈值比较器的系统和用于承载电弧检测标志和阈值更新的通信通道
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Application No.: US11893352Application Date: 2007-08-15
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Publication No.: US07750644B2Publication Date: 2010-07-06
- Inventor: John Pipitone , Ryan Nunn-Gage
- Applicant: John Pipitone , Ryan Nunn-Gage
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Law Office of Robert M. Wallace
- Main IPC: H01H9/50
- IPC: H01H9/50 ; C23C14/34
Abstract:
A plasma reactor system for processing a wafer in which respective comparators are coupled to the respective RF transient sensors which are coupled in turn to respective RF power application points. The comparators have respective comparison thresholds. The system further includes a controller programmed to updating the respective thresholds of the comparators with respective updated thresholds for different ones of the steps of the process recipe.
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