Invention Grant
- Patent Title: Position measuring method, position measuring system, and exposure apparatus
- Patent Title (中): 位置测量方法,位置测量系统和曝光设备
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Application No.: US11951615Application Date: 2007-12-06
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Publication No.: US07751060B2Publication Date: 2010-07-06
- Inventor: Takatoshi Tanaka
- Applicant: Takatoshi Tanaka
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2006-331141 20061207
- Main IPC: G01B11/02
- IPC: G01B11/02

Abstract:
A position measuring system includes a laser interferometer, and a wavelength detection unit detecting the wavelength change of a laser beam. A phase compensation unit compensates for the wavelength change detected by the wavelength detection unit based on the phase difference of aerial vibration between the wavelength detection unit and the optical path of the laser interferometer, which is determined based on the difference in length between a first path of the aerial vibration from the aerial vibration source of an air conditioner to the wavelength detection unit and a second path of the aerial vibration from the aerial vibration source to the optical path of the laser interferometer. A position measuring unit compensates for a measurement value obtained by the laser interferometer on the basis of the compensated wavelength change. In the position measuring system, the first path is designed to be shorter than the second path.
Public/Granted literature
- US20080137097A1 POSITION MEASURING METHOD, POSITION MEASURING SYSTEM, AND EXPOSURE APPARATUS Public/Granted day:2008-06-12
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