Invention Grant
- Patent Title: High flux X-ray target and assembly
- Patent Title (中): 高通量X射线靶和组装
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Application No.: US11856328Application Date: 2007-09-17
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Publication No.: US07751530B2Publication Date: 2010-07-06
- Inventor: Mandyam Sridhar , Manoharan Venugopal , Debasish Mishra , Savio Sebastian , Harith Vadari , Mark Frontera
- Applicant: Mandyam Sridhar , Manoharan Venugopal , Debasish Mishra , Savio Sebastian , Harith Vadari , Mark Frontera
- Applicant Address: US NY Schenectady
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Schenectady
- Agency: McNees Wallace & Nurick, LLC
- Main IPC: H01J35/26
- IPC: H01J35/26 ; H01J35/28

Abstract:
An X-ray tube anode assembly, an X-ray tube assembly and a method for heat management to an X-ray assembly having a movable X-ray target having a target surface. The anode assembly includes a drive member arranged and disposed to provide oscillatory motion to the target assembly and a target surface that is configured to remain at a substantially fixed distance from a cathode assembly during oscillatory motion.
Public/Granted literature
- US20090074145A1 HIGH FLUX X-RAY TARGET AND ASSEMBLY Public/Granted day:2009-03-19
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