Invention Grant
- Patent Title: Methods for fabricating thin complaint spring contacts
- Patent Title (中): 制造薄型弹簧触点的方法
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Application No.: US11039949Application Date: 2005-01-24
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Publication No.: US07752738B2Publication Date: 2010-07-13
- Inventor: Thomas H. DiStefano
- Applicant: Thomas H. DiStefano
- Applicant Address: US CA Palo Alto
- Assignee: Palo Alto Research Center Incorporated
- Current Assignee: Palo Alto Research Center Incorporated
- Current Assignee Address: US CA Palo Alto
- Agency: Oliff & Berridge, PLC
- Main IPC: H01H11/00
- IPC: H01H11/00 ; H01H65/00

Abstract:
Systems and methods are provided for fabricating compliant spring contacts for use in, for example, IC packaging and interconnection between multi-layers in stacked IC packages and electronic components. Internal stresses generated within an formed film are released to cause the film to buckle and/or bow away from a supporting terminal. A thin stressed metal film layer is selectively broken away from the substrate of the supporting terminal allowing the stressed metal film to take on a bowed and/or spring-like shaped through minute deformation based on a release of the internal stresses. The resultant thin compliant spring contact can deform a small amount as the spring contact is then pressed against a compatible mating contact surface in an overlying layer.
Public/Granted literature
- US20060130319A1 Systems and methods for fabricating thin complaint spring contacts from stressed metal films Public/Granted day:2006-06-22
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