Invention Grant
- Patent Title: Pattern forming method, liquid droplet discharging apparatus, and electrooptical device
- Patent Title (中): 图案形成方法,液滴喷射装置和电光装置
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Application No.: US12052949Application Date: 2008-03-21
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Publication No.: US07753482B2Publication Date: 2010-07-13
- Inventor: Kohei Ishida
- Applicant: Kohei Ishida
- Applicant Address: JP
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JP2007-074132 20070322
- Main IPC: B41J2/15
- IPC: B41J2/15 ; B41J2/145

Abstract:
A pattern forming method forms a pattern on a substrate by relatively moving a plurality of nozzle groups each including a plurality of nozzles arranged in a first direction and the substrate a plurality of times in a main-scanning direction to allow the nozzles to discharge liquid droplets thereon. The method includes (i) relatively moving each nozzle group and the substrate in a sub-scanning direction such that a rear end of a former nozzle group overlaps a front end of a latter nozzle group when viewed from the main-scanning direction after every relative movement between the nozzle group and the substrate in the main-scanning direction; (ii) selecting a plurality of former nozzles among the nozzles of the former group that overlap those of the latter group to allow the selected former nozzles to discharge liquid droplets upon the relative movement between the former group and the substrate in the main-scanning direction; and (iii) selecting a plurality of latter nozzles positioned between the selected former nozzles among the nozzles of the latter group that overlap those of the former group to allow the selected latter nozzles to discharge liquid droplets upon the relative movement between the latter group and the substrate in the main-scanning direction.
Public/Granted literature
- US20080231658A1 PATTERN FORMING METHOD, LIQUID DROPLET DISCHARGING APPARATUS, AND ELECTROOPTICAL DEVICE Public/Granted day:2008-09-25
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