Invention Grant
US07754015B2 Vacuum vapor-deposition apparatus and method of producing vapor-deposited film 有权
真空蒸镀装置及蒸镀膜的制造方法

Vacuum vapor-deposition apparatus and method of producing vapor-deposited film
Abstract:
This invention relates to a vacuum vapor-deposition apparatus for forming vapor-deposited films on a base film, thereby to produce vapor-deposited films, and also to a method of producing vapor-deposited films. In the vacuum vapor-deposition apparatus, the synchronizing means equalizes the circumference velocity v1 of the coating roll and the circumference velocity v2 of the takeup guide roll. Hence, v1=v2. Therefore, the takeup guide roll never rubs the vapor-deposited layer provided on the surface of the film. This eliminates the possibility that the vapor-deposited layer has scratches. The vapor-deposited layer can therefore possess desired properties.
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