Invention Grant
- Patent Title: Vacuum vapor-deposition apparatus and method of producing vapor-deposited film
- Patent Title (中): 真空蒸镀装置及蒸镀膜的制造方法
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Application No.: US11157163Application Date: 2005-06-21
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Publication No.: US07754015B2Publication Date: 2010-07-13
- Inventor: Noboru Sasaki , Hiroshi Suzuki , Fumitake Koizumi , Nobuhiko Imai , Kunimasa Arai , Hiroyuki Konagai
- Applicant: Noboru Sasaki , Hiroshi Suzuki , Fumitake Koizumi , Nobuhiko Imai , Kunimasa Arai , Hiroyuki Konagai
- Applicant Address: JP Tokyo DE Alzenau
- Assignee: Toppan Printing Co., Ltd.,Applied Materials GmbH & Co. KG
- Current Assignee: Toppan Printing Co., Ltd.,Applied Materials GmbH & Co. KG
- Current Assignee Address: JP Tokyo DE Alzenau
- Agency: Staas & Halsey LLP
- Priority: JP2002-376933 20021226
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23C14/00

Abstract:
This invention relates to a vacuum vapor-deposition apparatus for forming vapor-deposited films on a base film, thereby to produce vapor-deposited films, and also to a method of producing vapor-deposited films. In the vacuum vapor-deposition apparatus, the synchronizing means equalizes the circumference velocity v1 of the coating roll and the circumference velocity v2 of the takeup guide roll. Hence, v1=v2. Therefore, the takeup guide roll never rubs the vapor-deposited layer provided on the surface of the film. This eliminates the possibility that the vapor-deposited layer has scratches. The vapor-deposited layer can therefore possess desired properties.
Public/Granted literature
- US20050249875A1 Vacuum vapor-deposition apparatus and method of producing vapor-deposited film Public/Granted day:2005-11-10
Information query
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