The invention provides a transparent conductive film which exhibits low resistance and high transmittance, is an amorphous film, can be relatively readily patterned by etching with a weak acid, and can be relatively readily crystallized, and a method for producing the film.The transparent conductive film deposited from a sputtering target containing a sintered oxide including indium oxide, barium, and, in accordance with needs, tin, characterized in that the film contains indium oxide, barium, and, in accordance with needs, tin.