Invention Grant
- Patent Title: Method for manufacturing surface acoustic wave device
- Patent Title (中): 声表面波装置的制造方法
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Application No.: US12347262Application Date: 2008-12-31
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Publication No.: US07754136B2Publication Date: 2010-07-13
- Inventor: Tai-Hsu Chou
- Applicant: Tai-Hsu Chou
- Applicant Address: TW Tu-Cheng, Taipei Hsien
- Assignee: Hon Hai Precision Industry Co., Ltd.
- Current Assignee: Hon Hai Precision Industry Co., Ltd.
- Current Assignee Address: TW Tu-Cheng, Taipei Hsien
- Agent Clifford O. Chi
- Priority: CN200810301711 20080521
- Main IPC: B29C35/08
- IPC: B29C35/08

Abstract:
A method for manufacturing a surface acoustic wave device comprises depositing a detecting material layer on a substrate, forming a predetermined pattern on the detecting material layer using a nanoimprint method to obtain a detecting film with a predetermined pattern formed thereon, and forming an input interdigital transducer and an output interdigital transducer on two opposite sides of the detecting material layer on the substrate, thus obtaining a surface acoustic wave device comprising the detecting film.
Public/Granted literature
- US20090289395A1 METHOD FOR MANUFACTURING SURFACE ACOUSTIC WAVE DEVICE Public/Granted day:2009-11-26
Information query
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