Invention Grant
US07754341B2 Films with superior impact resistance and improved catastrophic failure resistance under high strain rate
有权
在高应变率下具有优异抗冲击性和改善的灾难性破坏性能的薄膜
- Patent Title: Films with superior impact resistance and improved catastrophic failure resistance under high strain rate
- Patent Title (中): 在高应变率下具有优异抗冲击性和改善的灾难性破坏性能的薄膜
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Application No.: US10579429Application Date: 2004-11-29
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Publication No.: US07754341B2Publication Date: 2010-07-13
- Inventor: Wenbin Liang , David B. Ramsey , Staci A. DeKunder , Kalyan Sehanobish , Jesus Nieto , John L. Presa , Shaun E. Pirtle
- Applicant: Wenbin Liang , David B. Ramsey , Staci A. DeKunder , Kalyan Sehanobish , Jesus Nieto , John L. Presa , Shaun E. Pirtle
- Applicant Address: US MI Midland
- Assignee: Dow Global Technologies Inc.
- Current Assignee: Dow Global Technologies Inc.
- Current Assignee Address: US MI Midland
- International Application: PCT/US2004/039823 WO 20041129
- International Announcement: WO2005/065945 WO 20050721
- Main IPC: B32B27/32
- IPC: B32B27/32 ; B32B27/08
Abstract:
Stretch films which exhibit good puncture and impact resistance while also exhibiting resistance to defect propagation are desired. The films of the present invention have an ultimate stretch of at least 200 percent, a dart impact strength of at least about 700 gms/mil and a catastrophic failure stretch of at least 95 percent of the elongation to break value (CF of 5 or less). The films preferably comprise at least 3 layers and preferably comprise at least 50 percent by weight of polyethylene polymers.
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