Invention Grant
US07754351B2 Epitaxial (001) BiFeO3 membranes with substantially reduced fatigue and leakage
有权
外延（001）BiFeO3膜具有显着降低的疲劳和泄漏
- Patent Title: Epitaxial (001) BiFeO3 membranes with substantially reduced fatigue and leakage
- Patent Title (中): 外延（001）BiFeO3膜具有显着降低的疲劳和泄漏
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Application No.: US12117464Application Date: 2008-05-08
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Publication No.: US07754351B2Publication Date: 2010-07-13
- Inventor: Chang-Beom Eom , Ho Won Jang
- Applicant: Chang-Beom Eom , Ho Won Jang
- Applicant Address: US WI Madison
- Assignee: Wisconsin Alumni Research Foundation (WARF)
- Current Assignee: Wisconsin Alumni Research Foundation (WARF)
- Current Assignee Address: US WI Madison
- Agency: Bell & Manning, LLC
- Main IPC: B32B9/04
- IPC: B32B9/04 ; B32B43/00
Abstract:
The present invention provides free-standing heterostructures including a layer of BiFeO3 and a layer comprising a perovskite over which the BiFeO3 is epitaxially grown. The layer comprising the perovskite has been released from a substrate upon which it was originally grown. Also provided are methods for forming the free-standing heterostructures, which may include transferring the free-standing heterostructures to other host substrates.
Public/Granted literature
- US20090280355A1 EPITAXIAL (001) BiFeO3 MEMBRANES WITH SUBSTANTIALLY REDUCED FATIGUE AND LEAKAGE Public/Granted day:2009-11-12
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