Invention Grant
US07754504B2 Light-emitting diode, method for making light-emitting diode, integrated light-emitting diode and method for making integrated light-emitting diode, method for growing a nitride-based III-V group compound semiconductor, light source cell unit, light-emitting diode
失效
发光二极管,制造发光二极管的方法,集成发光二极管和制造集成发光二极管的方法,用于生长氮化物III-V族化合物半导体的方法,光源电池单元,发光 二极管
- Patent Title: Light-emitting diode, method for making light-emitting diode, integrated light-emitting diode and method for making integrated light-emitting diode, method for growing a nitride-based III-V group compound semiconductor, light source cell unit, light-emitting diode
- Patent Title (中): 发光二极管,制造发光二极管的方法,集成发光二极管和制造集成发光二极管的方法,用于生长氮化物III-V族化合物半导体的方法,光源电池单元,发光 二极管
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Application No.: US11383526Application Date: 2006-05-16
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Publication No.: US07754504B2Publication Date: 2010-07-13
- Inventor: Akira Ohmae , Shigetaka Tomiya , Yuki Maeda , Michinori Shiomi , Takaaki Ami , Takao Miyajima , Katsunori Yanashima , Takashi Tange , Atsushi Yasuda
- Applicant: Akira Ohmae , Shigetaka Tomiya , Yuki Maeda , Michinori Shiomi , Takaaki Ami , Takao Miyajima , Katsunori Yanashima , Takashi Tange , Atsushi Yasuda
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sonnenschein Nath & Rosenthal LLP
- Priority: JPP2005-142462 20050516; JPP2006-105647 20060406
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method for making a light-emitting diode, which including the steps of: providing a substrate having at least one recessed portion on one main surface and growing a first nitride-based III-V group compound semiconductor layer through a state of making a triangle in section having a bottom surface of the recessed portion as a base thereby burying the recessed portion; laterally growing a second nitride-based III-V group compound semiconductor layer from the first nitride-based III-V group compound semiconductor layer over the substrate; and successively growing a third nitride-based III-V group compound semiconductor layer of a first conduction type, an active layer and a fourth nitride-based III-V group compound semiconductor layer of a second conduction type on the second nitride-based III-V group compound semiconductor layer.
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