Invention Grant
- Patent Title: Method of removing the growth substrate of a semiconductor light emitting device
- Patent Title (中): 去除半导体发光器件的生长衬底的方法
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Application No.: US11149679Application Date: 2005-06-09
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Publication No.: US07754507B2Publication Date: 2010-07-13
- Inventor: John E. Epler , Oleg B. Shchekin , Franklin J. Wall, Jr. , Jonathan J. Wierer, Jr. , Ling Zhou
- Applicant: John E. Epler , Oleg B. Shchekin , Franklin J. Wall, Jr. , Jonathan J. Wierer, Jr. , Ling Zhou
- Assignee: Philips Lumileds Lighting Company, LLC,Koninklijke Philips Electronics N.V.
- Current Assignee: Philips Lumileds Lighting Company, LLC,Koninklijke Philips Electronics N.V.
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A semiconductor structure formed on a growth substrate and including a light emitting layer disposed between an n-type region and a p-type region is attached to a carrier by a connection that supports the semiconductor structure sufficiently to permit removal of the growth substrate. In some embodiments, the semiconductor structure is a flip chip device. The semiconductor structure may be attached to the carrier by, for example, a metal bond that supports almost the entire lateral extent of the semiconductor structure, or by interconnects such as solder or gold stud bumps. An underfill material which supports the semiconductor structure is introduced in any spaces between the interconnects. The underfill material may be a liquid that is cured to form a rigid structure. The growth substrate may then be removed without causing damage to the semiconductor structure.
Public/Granted literature
- US20060281203A1 Method of removing the growth substrate of a semiconductor light emitting device Public/Granted day:2006-12-14
Information query
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