Invention Grant
- Patent Title: Laser lift-off method
- Patent Title (中): 激光剥离法
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Application No.: US12169317Application Date: 2008-07-08
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Publication No.: US07754511B2Publication Date: 2010-07-13
- Inventor: Wei-Chih Wen , Liang-Jyi Yan , Chih-Sung Chang
- Applicant: Wei-Chih Wen , Liang-Jyi Yan , Chih-Sung Chang
- Applicant Address: TW Taichung County
- Assignee: High Power Opto. Inc.
- Current Assignee: High Power Opto. Inc.
- Current Assignee Address: TW Taichung County
- Agency: Muncy, Geissler, Olds, & Lowe, PLLC
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
The present invention discloses a laser lift-off method, which applies to lift off a transient substrate from an epitaxial layer grown on the transient substrate after a support substrate having an adhesion metal layer is bonded to the epitaxial layer. Firstly, the epitaxial layer is etched to define separation channels around each chip section, and the epitaxial layer between two separation channels is not etched but preserved to form a separation zone. Each laser illumination area only covers one illuminated chip section, the separation channels surrounding the illuminated chip section, and the separation zones surrounding the illuminated chip section. Thus, the adhesion metal layer on the separation channels is only heated once. Further, the outward stress generated by the illuminated chip section is counterbalanced by the outward stress generated by the illuminated separation zones, and the stress-induced structural damage on the chip section is reduced.
Public/Granted literature
- US20100009515A1 LASER LIFT-OFF METHOD Public/Granted day:2010-01-14
Information query
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