Invention Grant
- Patent Title: Millisecond annealing (DSA) edge protection
- Patent Title (中): 毫秒退火（DSA）边缘保护
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Application No.: US12032475Application Date: 2008-02-15
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Publication No.: US07754518B2Publication Date: 2010-07-13
- Inventor: Blake Koelmel , Robert C. McIntosh , David D L Larmagnac , Alexander N. Lerner , Abhilash J. Mayur , Joseph Yudovsky
- Applicant: Blake Koelmel , Robert C. McIntosh , David D L Larmagnac , Alexander N. Lerner , Abhilash J. Mayur , Joseph Yudovsky
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: H01L21/00
- IPC: H01L21/00
Abstract:
A method and apparatus for thermally processing a substrate is provided. A substrate is disposed within a processing chamber configured for thermal processing by directing electromagnetic energy toward a surface of the substrate. An energy blocker is provided to block at least a portion of the energy directed toward the substrate. The blocker prevents damage to the substrate from thermal stresses as the incident energy approaches an edge of the substrate.
Public/Granted literature
- US20090209112A1 MILLISECOND ANNEALING (DSA) EDGE PROTECTION Public/Granted day:2009-08-20
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