A method for manufacturing an inductor according to the embodiment comprises the steps of: forming a first photoresist pattern; forming an impurity region forming the inductor by implanting an impurity ion to the substrate by means of the first photoresist pattern and a pad region applying current across the impurity region; forming a second photoresist pattern so that a position spaced by a predetermined interval from the impurity region is opened; and forming a guard impurity region in the position spaced from the impurity region by implanting the same impurity ion as the impurity ion by means of the second photoresist pattern.