Invention Grant
- Patent Title: Laser processing method
- Patent Title (中): 激光加工方法
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Application No.: US12094050Application Date: 2006-11-16
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Publication No.: US07754583B2Publication Date: 2010-07-13
- Inventor: Takeshi Sakamoto
- Applicant: Takeshi Sakamoto
- Applicant Address: JP Hamamatsu-shi, Shizuoka
- Assignee: Hamamatsu Photonics K.K.
- Current Assignee: Hamamatsu Photonics K.K.
- Current Assignee Address: JP Hamamatsu-shi, Shizuoka
- Agency: Drinker Biddle & Reath LLP
- Priority: JP2005-334734 20051118
- International Application: PCT/JP2006/322871 WO 20061116
- International Announcement: WO2007/058262 WO 20070524
- Main IPC: H01L21/301
- IPC: H01L21/301

Abstract:
A laser processing method which can securely prevent particles from attaching to chips obtained by cutting a planar object is provided. When applying a stress to an object to be processed 1 through an expandable tape 23, forming materials of the object 1 (the object 1 formed with molten processed regions 13, semiconductor chips 25 obtained by cutting the object 1, particles produced from cut sections of the semiconductor chips 25, and the like) are irradiated with soft x-rays. As a consequence, the particles produced from the cut sections of the semiconductor chips 25 obtained by cutting the object 1 fall on the expandable tape 23 without dispersing randomly. This can securely prevent the particles from attaching to the semiconductor chips 25 obtained by cutting the object 1.
Public/Granted literature
- US20090162994A1 LASER PROCESSING METHOD Public/Granted day:2009-06-25
Information query
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