Low-irritation compositions and methods of making the same
Abstract:
Provided are compositions comprising low molecular weight polymeric materials and surfactants having reduced irritation associated therewith, methods of reducing the irritation associated with a personal care composition comprising an anionic and/or amphoteric surfactant, the methods comprising combining a low molecular weight polymeric material capable of binding a surfactant thereto with an anionic surfactant to produce a reduced irritation personal care composition, and methods of using such compositions to cleanse the hair or skin with reduced irritation.
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