Invention Grant
US07754780B2 Resist for forming pattern and method for forming pattern using the same
有权
用于形成图案的抗蚀剂和使用其形成图案的方法
- Patent Title: Resist for forming pattern and method for forming pattern using the same
- Patent Title (中): 用于形成图案的抗蚀剂和使用其形成图案的方法
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Application No.: US11148565Application Date: 2005-06-09
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Publication No.: US07754780B2Publication Date: 2010-07-13
- Inventor: Jin-Wuk Kim
- Applicant: Jin-Wuk Kim
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge
- Priority: KR10-2004-0045699 20040618
- Main IPC: C09D125/04
- IPC: C09D125/04 ; H01L21/84
Abstract:
A method for forming a pattern includes forming an etching object layer on a substrate, applying a resist on an etching object layer, the resist including a photo-initiator, and a liquid pre-polymer including a vinyl functional group and a hydrophilic functional group, shaping the resist using a mold plate having an imprint formed therein, and hardening the resist to form a resist pattern while the mold plate shaping the resist corresponding to the imprint.
Public/Granted literature
- US20050282402A1 Resist for forming pattern and method for forming pattern using the same Public/Granted day:2005-12-22
Information query
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