Invention Grant
- Patent Title: Cleaning device using atmospheric gas discharge plasma
- Patent Title (中): 使用大气气体放电等离子体的清洗装置
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Application No.: US11637869Application Date: 2006-12-13
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Publication No.: US07754994B2Publication Date: 2010-07-13
- Inventor: Jyh-Ming Yan , Shiaw-Huei Chen , Ming-Song Yang , Men-Han Huang , Yung-Chih Chen
- Applicant: Jyh-Ming Yan , Shiaw-Huei Chen , Ming-Song Yang , Men-Han Huang , Yung-Chih Chen
- Applicant Address: TW Taoyuan
- Assignee: Atomic Energy Council
- Current Assignee: Atomic Energy Council
- Current Assignee Address: TW Taoyuan
- Agency: Jackson IPG PLLC
- Main IPC: B23K15/00
- IPC: B23K15/00 ; C23C16/00
Abstract:
Atmospheric gas discharge plasma is generated in a gas whirlpool cavity. Then the plasma is sprayed out in a gas flow to clean an object. The whole process is simple with merits of utility and cost savings. And objects can be cleaned one after one continuously.
Public/Granted literature
- US20080142057A1 Cleaning device using atmospheric gas discharge plasma Public/Granted day:2008-06-19
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