Invention Grant
US07755033B2 Method for analyzing minute amounts of Pd, Rh and Ru, and high frequency plasma mass spectroscope used for same
失效
分析少量Pd，Rh和Ru的方法，以及用于其的高频等离子体质谱仪
- Patent Title: Method for analyzing minute amounts of Pd, Rh and Ru, and high frequency plasma mass spectroscope used for same
- Patent Title (中): 分析少量Pd，Rh和Ru的方法，以及用于其的高频等离子体质谱仪
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Application No.: US12068860Application Date: 2008-02-12
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Publication No.: US07755033B2Publication Date: 2010-07-13
- Inventor: Kenichi Kamimura , Satoshi Kawada , Kouji Tsuchiya
- Applicant: Kenichi Kamimura , Satoshi Kawada , Kouji Tsuchiya
- Applicant Address: JP Tokyo
- Assignee: Nippon Mining & Metals Co., Ltd.
- Current Assignee: Nippon Mining & Metals Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2007-072442 20070320
- Main IPC: B01D59/44
- IPC: B01D59/44
Abstract:
The invention provides a method for analyzing minute amounts of Pd, Rh and Ru with high accuracy by a high-frequency plasma mass spectroscope. The method comprises (1) a step of pretreating a sample by an alkali fusion method using a sodium compound; and (2) a step of analyzing the pretreated sample using a high-frequency plasma mass spectroscope; wherein, in step (2), the distance between a sampling cone and a skimmer cone is adjusted such that the concentration of 40Ar65Cu which interferes with Pd, the concentrations of 40Ar63Cu and 40Ar40Ar23Na which interfere with Rh, and the concentrations of 38Ar63Cu and 40Ar38Ar23Na which interfere with Ru are all equal to or less than 0.05 ppb.
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