Invention Grant
- Patent Title: Forming self-aligned nano-electrodes
- Patent Title (中): 形成自对准纳米电极
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Application No.: US11983260Application Date: 2007-11-08
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Publication No.: US07755082B2Publication Date: 2010-07-13
- Inventor: Valery M. Dubin , Swaminathan Sivakumar , Andrew A. Berlin , Mark Bohr
- Applicant: Valery M. Dubin , Swaminathan Sivakumar , Andrew A. Berlin , Mark Bohr
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Trop, Pruner & Hu, P.C.
- Main IPC: H01L29/08
- IPC: H01L29/08 ; H01L35/24 ; H01L51/00

Abstract:
A nano-electrode or nano-wire may be etched centrally to form a gap between nano-electrode portions. The portions may ultimately constitute a single electron transistor. The source and drain formed from the electrode portions are self-aligned with one another. Using spacer technology, the gap between the electrodes may be made very small.
Public/Granted literature
- US20080116439A1 Forming self-aligned nano-electrodes Public/Granted day:2008-05-22
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