Invention Grant
- Patent Title: Semiconductor storage device and method of manufacturing the same
- Patent Title (中): 半导体存储装置及其制造方法
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Application No.: US11978600Application Date: 2007-10-30
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Publication No.: US07755093B2Publication Date: 2010-07-13
- Inventor: Shinji Ohara
- Applicant: Shinji Ohara
- Applicant Address: JP Chuo-ku, Tokyo
- Assignee: Elpida Memory, Inc.
- Current Assignee: Elpida Memory, Inc.
- Current Assignee Address: JP Chuo-ku, Tokyo
- Agency: McGinn IP Law Group, PLLC
- Priority: JP2006-301478 20061107
- Main IPC: H01L29/04
- IPC: H01L29/04

Abstract:
A nonvolatile semiconductor storage device is provided in which memory cells comprising PN junction diodes having satisfactory rectifying characteristics are arranged in three dimensions. The semiconductor storage device includes: a first wire which extends in one direction; a second wire which extends in a direction intersecting the first wire; and a memory cell which is positioned at a portion of intersection of the first wire with the second wire between the first wire and the second wire, the memory cell comprising a storage element and a PN junction diode connected thereto, positioned on a side of the second wire used in selecting the memory cell, and a P-type semiconductor forming the PN junction diode forms a portion of the second wire, wherein a plurality of structures, each structure comprising the first wire, the second wire, and the memory cell is provided three-dimensionally.
Public/Granted literature
- US20080105878A1 Semiconductor storage device and method of manufacturing the same Public/Granted day:2008-05-08
Information query
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