Invention Grant
US07755153B2 Structure and method for a magnetic memory device with proximity writing
有权
具有接近写入功能的磁存储器件的结构和方法
- Patent Title: Structure and method for a magnetic memory device with proximity writing
- Patent Title (中): 具有接近写入功能的磁存储器件的结构和方法
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Application No.: US11332748Application Date: 2006-01-13
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Publication No.: US07755153B2Publication Date: 2010-07-13
- Inventor: ChiaHua Ho , Kuang Yeu Hsieh
- Applicant: ChiaHua Ho , Kuang Yeu Hsieh
- Applicant Address: TW
- Assignee: Macronix International Co. Ltd.
- Current Assignee: Macronix International Co. Ltd.
- Current Assignee Address: TW
- Agency: Baker & McKenzie LLP
- Main IPC: H01L43/00
- IPC: H01L43/00

Abstract:
An MRAM device comprises a plurality of MRAM structures, each MRAM structure comprising a magnetoresistive memory cell in close proximity to a high permeability conductive line and a single transistor configured to access the magnetoresistive memory cell for both read and write operations. The high permeability conductive line acts a current path for both read and write operations, thereby reducing the number of metal bit lines.
Public/Granted literature
- US20070164381A1 Structure and method for a magnetic memory device with proximity writing Public/Granted day:2007-07-19
Information query
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