Invention Grant
- Patent Title: Exposure apparatus
- Patent Title (中): 曝光装置
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Application No.: US12024332Application Date: 2008-02-01
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Publication No.: US07755740B2Publication Date: 2010-07-13
- Inventor: Izumi Tsukamoto , Hideki Nogawa
- Applicant: Izumi Tsukamoto , Hideki Nogawa
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. I.P. Division
- Priority: JP2007-027463 20070207; JP2007-334573 20071226
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52

Abstract:
An exposure apparatus exposing a plurality of shot areas on a substrate to light through a liquid includes a movable stage including a chuck configured to hold the substrate and a plate arranged around of the chuck, a projection optical system configured to project a light through an original onto the substrate held by the chuck, a first liquid supply nozzle arranged along a periphery of a final optical element of the projection optical system, and a plurality of second liquid supply nozzles arranged on the stage. The exposure apparatus supplies the liquid to a gap between the final optical element and the substrate through the first liquid supply nozzle. The exposure apparatus selects a nozzle for supplying the liquid from among the plurality of the second liquid supply nozzles based on a location of an exposure shot area on the substrate.
Public/Granted literature
- US20080187872A1 EXPOSURE APPARATUS Public/Granted day:2008-08-07
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