Invention Grant
- Patent Title: Defect inspection apparatus, sensitivity calibration method for the same, substrate for defect detection sensitivity calibration, and manufacturing method thereof
- Patent Title (中): 缺陷检查装置，其灵敏度校准方法，缺陷检测灵敏度校准用基板及其制造方法
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Application No.: US11501755Application Date: 2006-08-10
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Publication No.: US07755753B2Publication Date: 2010-07-13
- Inventor: Naohiro Takahashi , Tamihide Yasumoto
- Applicant: Naohiro Takahashi , Tamihide Yasumoto
- Applicant Address: JP Yokohama
- Assignee: Fujitsu Semiconductor Limited
- Current Assignee: Fujitsu Semiconductor Limited
- Current Assignee Address: JP Yokohama
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2005-233644 20050811; JP2006-077573 20060320
- Main IPC: G01N21/88
- IPC: G01N21/88 ; G01F9/00
Abstract:
A reference substrate for defect detection sensitivity calibration has: patterns and programmed defective portions which are cone defects with different sizes and are formed at random on a silicon substrate. By using the reference substrate for defect detection sensitivity calibration, it is possible to obtain an index, usable in manufacturing management, for determining sensitivity adjustment after a lamp is replaced in an illumination part of a defect inspection apparatus.
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