Invention Grant
- Patent Title: Semiconductor laser apparatus
- Patent Title (中): 半导体激光装置
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Application No.: US12031027Application Date: 2008-02-14
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Publication No.: US07756179B2Publication Date: 2010-07-13
- Inventor: Kimio Shigihara
- Applicant: Kimio Shigihara
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Leydig, Voit & Mayer, Ltd.
- Priority: JP2007-248887 20070926
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
A semiconductor laser apparatus can improve electric conversion efficiency to a satisfactory extent. The apparatus includes an n-type cladding layer, an n-type cladding layer side guide layer, an active layer, a p-type cladding layer side guide layer, and a p-type cladding layer, wherein electrons and holes are injected into the active layer, transverse to the active layer, through the n-type cladding layer side guide layer and the p-type cladding layer side guide layer. The p-type cladding layer side guide layer is thinner than the n-type cladding layer side guide layer to position the active layer closer to the p-type cladding layer, and, at the same time, the refractive index of the p-type cladding layer side guide layer is higher than the refractive index of the n-type cladding layer side guide layer.
Public/Granted literature
- US20090080484A1 SEMICONDUCTOR LASER APPARATUS Public/Granted day:2009-03-26
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