Invention Grant
- Patent Title: Line narrowed laser apparatus
- Patent Title (中): 线窄激光设备
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Application No.: US11453519Application Date: 2006-06-15
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Publication No.: US07756183B2Publication Date: 2010-07-13
- Inventor: Osamu Wakabayashi , Takahito Kumazaki
- Applicant: Osamu Wakabayashi , Takahito Kumazaki
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: Komatsu Ltd,Ushio Inc.
- Current Assignee: Komatsu Ltd,Ushio Inc.
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Husch Blackwell Sanders Welsh & Katz
- Priority: JP2005-190368 20050629
- Main IPC: H01S3/09
- IPC: H01S3/09 ; H01S3/10

Abstract:
The control of the spectral purity width E95 is performed while imparting practically no effect to the control of a central wavelength, and the spectral purity width E95 is stabilized. A wavefront adjuster 32 is provided on an output side of the interior of an optical resonator, i.e., on an output coupler 31 side. Light generated in a laser chamber 10 is transmitted through the wavefront adjuster 32 from the laser chamber 10 side, and reaches the output coupler 31. In the wavefront adjuster 32, the distance between concave and convex lenses 33 and 34 is adjusted so that a desired spectral purity width E95 can be obtained. Then, when the light passes through the wavefront adjuster 32, the wavefront of the light is adjusted to a desired wavefront.
Public/Granted literature
- US20070014326A1 Line narrowed laser apparatus Public/Granted day:2007-01-18
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