Invention Grant
- Patent Title: Method for forming anti-reflective coating
- Patent Title (中): 防反射涂层的形成方法
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Application No.: US11666813Application Date: 2005-09-29
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Publication No.: US07756384B2Publication Date: 2010-07-13
- Inventor: Peng-Fei Fu , Eric Scott Moyer , Craig Rollin Yeakle
- Applicant: Peng-Fei Fu , Eric Scott Moyer , Craig Rollin Yeakle
- Applicant Address: US MI Midland
- Assignee: Dow Corning Corporation
- Current Assignee: Dow Corning Corporation
- Current Assignee Address: US MI Midland
- Agent Sharon K. Brady
- International Application: PCT/US2005/035235 WO 20050929
- International Announcement: WO2005/081865 WO 20050909
- Main IPC: G02B6/00
- IPC: G02B6/00
Abstract:
A method of forming an antireflective coating on an electronic device comprising (A) applying to an electronic device an ARC composition comprising (i) a silsesquioxane resin having the formula (PhSiO(3-x)/2(OHx)m HSiO(3-x)/2(OH)x)n, where Ph is a phenyl group, x has a value of 0, 1 or 2; m has a value of 0.05 to 0.95, n has a value of 0.05 to 0.95 and m+n≈1; and (ii) a solvent; and (B) removing the solvent and curing the silsesquioxane resin to form an antireflective coating on the electronic device.
Public/Granted literature
- US20080273561A1 Method for Forming Anti-Reflective Coating Public/Granted day:2008-11-06
Information query
