Invention Grant
US07756599B2 Substrate processing apparatus, program for performing operation and control method thereof, and computer readable storage medium storing the program
有权
衬底处理装置，用于执行其操作和控制方法的程序以及存储程序的计算机可读存储介质
- Patent Title: Substrate processing apparatus, program for performing operation and control method thereof, and computer readable storage medium storing the program
- Patent Title (中): 衬底处理装置，用于执行其操作和控制方法的程序以及存储程序的计算机可读存储介质
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Application No.: US11254668Application Date: 2005-10-21
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Publication No.: US07756599B2Publication Date: 2010-07-13
- Inventor: Tomoyuki Kudo , Jun Ozawa , Hiroshi Nakamura , Kazunori Kazama , Tsuyoshi Moriya , Hiroyuki Nakayama , Hiroshi Nagaike
- Applicant: Tomoyuki Kudo , Jun Ozawa , Hiroshi Nakamura , Kazunori Kazama , Tsuyoshi Moriya , Hiroyuki Nakayama , Hiroshi Nagaike
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2004-313475 20041028
- Main IPC: G06F19/00
- IPC: G06F19/00 ; B65H1/00 ; H01L21/306
Abstract:
A computer readable storage medium storing a program for performing an operation method of a substrate processing apparatus is provided. The operation method includes the steps of introducing a nonreactive gas into the vacuum preparation chamber before the gate valve is opened while the substrate is transferred between the vacuum preparation chamber of the vacuum processing unit and the transfer unit, stopping introducing the nonreactive gas when an inner pressure of the vacuum preparation chamber becomes same as an atmospheric pressure, starting an evacuation process of the corrosive gas in the vacuum preparation chamber and then opening to atmosphere performed by letting the vacuum preparation chamber communicate with an atmosphere, and opening the gate valve after the step of opening to atmosphere.
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