Invention Grant
- Patent Title: Method for manufacturing thin film capacitor
- Patent Title (中): 制造薄膜电容器的方法
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Application No.: US11928287Application Date: 2007-10-30
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Publication No.: US07771552B2Publication Date: 2010-08-10
- Inventor: Tadahiro Minamikawa , Atsuyoshi Maeda
- Applicant: Tadahiro Minamikawa , Atsuyoshi Maeda
- Applicant Address: JP Nagaokakyo-shi, Kyoto-fu
- Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee Address: JP Nagaokakyo-shi, Kyoto-fu
- Agency: Dickstein, Shapiro, LLP.
- Priority: JP2005-137187 20050510; JP2005-206942 20050715
- Main IPC: C03B29/00
- IPC: C03B29/00 ; B29C65/00 ; C04B33/32

Abstract:
A dielectric green sheet containing a dielectric ceramic powder, conductor green sheets containing a metal powder, and firing-assisting green sheets containing an inorganic oxide material powder are prepared, and the firing-assisting green sheet, the conductor green sheet, the dielectric green sheet, another conductor green sheet, and another firing-assisting green sheets are stacked in that order to prepare a laminate. The laminate is then fired. During firing, the bonding strength of the interfaces between the conductor green sheets and the firing-assisting green sheets is decreased and the oxygen partial pressure of the firing atmosphere is changed at least once so that the capacitor portion is separated from the firing-assisting green sheets. In this manner, a method for manufacturing thin film capacitor by which a high-reliability thin film capacitor can be produced at high efficiency and low cost without adversely affecting the characteristics of the thin film capacitor.
Public/Granted literature
- US20080060743A1 Method for Manufacturing Thin Film Capacitor Public/Granted day:2008-03-13
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