Invention Grant
- Patent Title: Method of producing nanoparticles using a evaporation-condensation process with a reaction chamber plasma reactor system
- Patent Title (中): 使用蒸发冷凝法与反应室等离子体反应器系统制备纳米颗粒的方法
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Application No.: US10537042Application Date: 2003-12-16
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Publication No.: US07771666B2Publication Date: 2010-08-10
- Inventor: Stephan Claude De La Veaux , Lu Zhang
- Applicant: Stephan Claude De La Veaux , Lu Zhang
- Applicant Address: US DE Wilmington
- Assignee: E. I. du Pont de Nemours and Company
- Current Assignee: E. I. du Pont de Nemours and Company
- Current Assignee Address: US DE Wilmington
- International Application: PCT/US03/40246 WO 20031216
- International Announcement: WO2004/056461 WO 20040708
- Main IPC: B01J12/00
- IPC: B01J12/00 ; C09C1/00 ; C01G23/047

Abstract:
The present invention provides a method and apparatus for the controlled synthesis of nanoparticles using a high temperature process. The reactor chamber includes a high temperature gas heated by means such as a plasma torch, and a reaction chamber. The homogenizer includes a region between the reactant inlets and the plasma (the spacer zone) to ensure that feeds from the reactant inlets are downstream of the recirculation zone induced by the high temperature gas. It also includes a region downstream of the reactant inlets that provides a nearly I dimensional (varying only in the axial direction) flow and concentration profile in the reaction zone to produce nanoparticles with narrow size distribution.
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