Invention Grant
- Patent Title: Extreme low resistivity light attenuation anti-reflection coating structure and method for manufacturing the same
- Patent Title (中): 极低电阻率光衰减抗反射涂层结构及其制造方法
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Application No.: US11905880Application Date: 2007-10-05
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Publication No.: US07771848B2Publication Date: 2010-08-10
- Inventor: Cheng-Chieh Chang , Shiu-Feng Liu , Pi-Jui Kuo
- Applicant: Cheng-Chieh Chang , Shiu-Feng Liu , Pi-Jui Kuo
- Applicant Address: TW Hsinchu
- Assignee: Innovation & Infinity Global Corp.
- Current Assignee: Innovation & Infinity Global Corp.
- Current Assignee Address: TW Hsinchu
- Agency: Rosenberg, Klein & Lee
- Main IPC: B32B7/00
- IPC: B32B7/00 ; B32B15/00

Abstract:
An extreme low resistivity light attenuation anti-reflection coating with a transparent surface conductive layer includes a substrate, a coating module, and a composed protection coating layer. The coating module is formed on a front surface of the substrate. The coating module is composed of a plurality of mixture coating layers and a plurality of metal coating layers that are alternately stacked with each other. Each mixture coating layer is composed of silicon carbide compound and Ti-based oxide. The composed protection coating layer is formed on the coating module.
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