Invention Grant
- Patent Title: Patterned magnetic medium, magnetic recording medium and magnetic storage device
- Patent Title (中): 图案磁介质,磁记录介质和磁存储装置
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Application No.: US11956424Application Date: 2007-12-14
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Publication No.: US07771853B2Publication Date: 2010-08-10
- Inventor: Tomio Iwasaki
- Applicant: Tomio Iwasaki
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2006-336476 20061214
- Main IPC: G11B5/66
- IPC: G11B5/66

Abstract:
A patterned magnetic medium includes: a substrate; a soft magnetic underlying film, a nonmagnetic film, an intermediate film and a recording layer which are formed on a principal surface of the substrate; a first protective film formed in contact with the recording film; a second protective film formed in contact with the first protective film; and a third protective film formed in contact with the second protective film. Moreover, the recording layer has a pattern structure formed by making a magnetic film come into contact with a concavo-convex pattern of a nonmagnetic material. The first protective film and the third protective film include carbon as the main constituent element and the second protective film is a wet-coated polymer film. High adhesion between carbon and the wet-coated polymer film can prevent peeling off and the wet-coated polymer film as a cushioning material absorbs impact.
Public/Granted literature
- US20080144218A1 PATTERNED MAGNETIC MEDIUM, MAGNETIC RECORDING MEDIUM AND MAGNETIC STORAGE DEVICE Public/Granted day:2008-06-19
Information query
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