Invention Grant
- Patent Title: Multilayer mirror, evaluation method, exposure apparatus, device manufacturing method
- Patent Title (中): 多层镜，评价方法，曝光装置，装置制造方法
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Application No.: US11760155Application Date: 2007-06-08
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Publication No.: US07771898B2Publication Date: 2010-08-10
- Inventor: Fumitaro Masaki , Akira Miyake
- Applicant: Fumitaro Masaki , Akira Miyake
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2006-160512 20060609
- Main IPC: G03F1/00
- IPC: G03F1/00 ; G03B27/42
Abstract:
A multilayer mirror used for EUV light includes a substrate, a reflection layer for reflecting the EUV light, a stress compensation layer, formed between the substrate and the reflection layer, for compensating a deformation of the substrate by the reflection layer, wherein the substrate has a first area, in which the stress compensation layer is layered but no reflection layer is layered.
Public/Granted literature
- US20070287076A1 MULTILAYER MIRROR, EVALUATION METHOD, EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD Public/Granted day:2007-12-13
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