Invention Grant
- Patent Title: Manufacturing method for photo mask
- Patent Title (中): 光罩制造方法
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Application No.: US11774677Application Date: 2007-07-09
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Publication No.: US07771900B2Publication Date: 2010-08-10
- Inventor: Goo Min Jeong
- Applicant: Goo Min Jeong
- Applicant Address: KR Icheon-si
- Assignee: Hynix Semiconductor Inc.
- Current Assignee: Hynix Semiconductor Inc.
- Current Assignee Address: KR Icheon-si
- Agency: Marshall, Gerstein & Borun LLP
- Priority: KR10-2006-0138849 20061229
- Main IPC: G03F1/00
- IPC: G03F1/00
Abstract:
A method for manufacturing a photo mask includes forming a mask pattern over a transparent substrate; forming a photoresist over the transparent substrate; subjecting the photoresist to an exposure light from the rear of the transparent substrate to form a photoresist pattern on the mask pattern; and correcting a line width in the mask pattern using the photoresist pattern as a mask.
Public/Granted literature
- US20080160430A1 Manufacturing Method for Photo Mask Public/Granted day:2008-07-03
Information query
