Invention Grant
- Patent Title: Two-photon absorbing optical recording material and two-photon absorbing optical recording and reproducing method
- Patent Title (中): 双光子吸收光学记录材料和双光子吸收光学记录和再现方法
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Application No.: US10874344Application Date: 2004-06-24
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Publication No.: US07771915B2Publication Date: 2010-08-10
- Inventor: Masaharu Akiba , Takeharu Tani , Hiroo Takizawa , Yoshio Inagaki
- Applicant: Masaharu Akiba , Takeharu Tani , Hiroo Takizawa , Yoshio Inagaki
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JPP.2003-184932 20030627; JPP.2003-284959 20030801; JPP.2003-300058 20030825
- Main IPC: G03C1/76
- IPC: G03C1/76
Abstract:
A two-photon absorbing optical recording material comprising at least one two-photon absorbing compound and a recording component is provided. Recording is made on it by utilizing the two-photon absorption of the two-photon absorbing compound in the material, and then the material is irradiated with light to thereby detect the difference in the reflectance between the recorded area and the unrecorded area thereof, and the recorded information is thereby reproduced from the material, and also provided are a photosensitive polymer composition and a photon-mode recording method for the material.
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