Invention Grant
US07771920B2 Anti-reflective polymer, anti-reflective composition containing the same, and method for forming pattern using the same
失效
防反射聚合物，含有该抗反射聚合物的抗反射组合物，以及使用其形成图案的方法
- Patent Title: Anti-reflective polymer, anti-reflective composition containing the same, and method for forming pattern using the same
- Patent Title (中): 防反射聚合物，含有该抗反射聚合物的抗反射组合物，以及使用其形成图案的方法
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Application No.: US12133511Application Date: 2008-06-05
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Publication No.: US07771920B2Publication Date: 2010-08-10
- Inventor: Jae Chang Jung
- Applicant: Jae Chang Jung
- Applicant Address: KR Seoul
- Assignee: Hynix Semiconductor Inc.
- Current Assignee: Hynix Semiconductor Inc.
- Current Assignee Address: KR Seoul
- Agency: Marshall, Gerstein & Borun LLP
- Priority: KR10-2007-0079944 20070809
- Main IPC: G03F7/11
- IPC: G03F7/11 ; G03F7/38 ; C08F16/38 ; C08F16/30
Abstract:
A polymer for crosslinking an anti-reflective film has a high refractive index. An anti-reflective composition containing the polymer for crosslinking is useful in an immersion lithography process using ArF (193 nm) of a semiconductor device manufacturing process.
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