Invention Grant
- Patent Title: Block copolymer and method for producing same
- Patent Title (中): 嵌段共聚物及其制造方法
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Application No.: US11547189Application Date: 2005-03-22
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Publication No.: US07772326B2Publication Date: 2010-08-10
- Inventor: Shizuo Kitahara
- Applicant: Shizuo Kitahara
- Applicant Address: JP Tokyo
- Assignee: Zeon Corporation
- Current Assignee: Zeon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2004-094497 20040329; JP2004-101960 20040331; JP2004-328875 20041112
- International Application: PCT/JP2005/005169 WO 20050322
- International Announcement: WO2005/092940 WO 20051006
- Main IPC: C08F8/48
- IPC: C08F8/48 ; C08F293/00 ; C08F297/02

Abstract:
The invention provides a novel block copolymer which can significantly improve the adhesion between a molded product composed of a nonpolar polymer such as polypropylene or polyethylene and a coating material or a molded product composed of a polar polymer, as well as a method for producing the same. Disclosed is a block copolymer comprising at least one poly (aromatic vinyl) block having a weight-average molecular weight of 1,000 to 500,000 and at least one cyclized poly (conjugated diene) block, as well as an oxygen scavenger and a modifier for polymer molding material, which comprise the block copolymer as an active ingredient.
Public/Granted literature
- US20080258105A1 Block Copolymer and Method for Producing Same Public/Granted day:2008-10-23
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