Invention Grant
- Patent Title: Pattern lock system for particle-beam exposure apparatus
- Patent Title (中): 用于粒子束曝光装置的图案锁定系统
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Application No.: US11719320Application Date: 2005-11-15
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Publication No.: US07772574B2Publication Date: 2010-08-10
- Inventor: Gerhard Stengl , Herbert Buschbeck , Robert Nowak
- Applicant: Gerhard Stengl , Herbert Buschbeck , Robert Nowak
- Applicant Address: AT Vienna
- Assignee: IMS Nanofabrication AG
- Current Assignee: IMS Nanofabrication AG
- Current Assignee Address: AT Vienna
- Agency: RatnerPrestia
- Priority: ATA1927/2004 20041117
- International Application: PCT/AT2005/000454 WO 20051115
- International Announcement: WO2006/053358 WO 20060526
- Main IPC: G21K5/10
- IPC: G21K5/10

Abstract:
In a pattern-lock system of particle-beam apparatus wherein the imaging of the pattern is done by means of at least two consecutive projector stages of the projecting system, reference marks are imaged upon registering means to determine the position of the particle-beam, at the location of an intermediary image of the reference marks produced by a non-final projector stage, with the registering means being positioned at locations of nominal positions of an intermediary imaging plane. Furthermore, to produce a scanning movement over the registering means the reference beamlets are shifted laterally by means of deflector means provided in the pattern defining means in dependence of a time-dependent electric voltage.
Public/Granted literature
- US20090146082A1 Pattern Lock System for Particle-Beam Exposure Apparatus Public/Granted day:2009-06-11
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