Invention Grant
- Patent Title: Gas sensitive field-effect-transistor
- Patent Title (中): 气体敏感场效应晶体管
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Application No.: US11393371Application Date: 2006-03-30
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Publication No.: US07772617B2Publication Date: 2010-08-10
- Inventor: Maximilian Fleischer , Hans Meixner , Uwe Lampe , Roland Pohle , Ralf Schneider , Elfriede Simon
- Applicant: Maximilian Fleischer , Hans Meixner , Uwe Lampe , Roland Pohle , Ralf Schneider , Elfriede Simon
- Applicant Address: DE Freiburg
- Assignee: Micronas GmbH
- Current Assignee: Micronas GmbH
- Current Assignee Address: DE Freiburg
- Agency: O'Shea Getz P.C.
- Priority: DE102005014777 20050331
- Main IPC: G01N27/414
- IPC: G01N27/414

Abstract:
A gas sensitive field effect transistor comprises a semiconductor substrate that includes a capacitance well, and source and drain regions of a field effect transistor. A gate of the field effect transistor is separated from the semiconductor substrate by an insulator, and a gas sensitive layer separated from the gate by an air gap. The field effect transistor provides an output signal indicative of the presence of a target gas within the air gap to an amplifier, which provides an amplified output signal that is electrically coupled to the capacitance well.
Public/Granted literature
- US20060278528A1 Method of effecting a signal readout on a gas-sensitive field-effect transistor Public/Granted day:2006-12-14
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