Invention Grant
- Patent Title: Image sensors and methods of fabricating same
- Patent Title (中): 图像传感器及其制造方法
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Application No.: US11426974Application Date: 2006-06-28
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Publication No.: US07772624B2Publication Date: 2010-08-10
- Inventor: Won-Je Park
- Applicant: Won-Je Park
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec
- Priority: KR10-2005-0063392 20050713
- Main IPC: H01L31/062
- IPC: H01L31/062

Abstract:
Image sensor devices are provided having reduced dark current generation characteristics. These image sensor devices include a semiconductor substrate and a photo-detector therein (e.g., P-N photodiode). The photo-detector includes a charge-generating region therein that is configured to convert photons received by the photo-detector into charge carriers. A first transistor, which has a terminal configured to receive the charge carriers generated by the photo-detector, is also provided. The first transistor includes a first gate electrode and a first pair of lightly doped source and drain regions of unequal width on opposite sides of the first gate electrode. This first transistor may be a three-terminal device and the terminal that is configured to receive the charge carriers may be selected from a group consisting of a gate, source and drain terminals. In particular, the first transistor may be configured as a reset transistor or as a source-follower transistor.
Public/Granted literature
- US20070012966A1 Image Sensors and Methods of Fabricating Same Public/Granted day:2007-01-18
Information query
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