Invention Grant
- Patent Title: Ferroelectric memory configured to prevent penetration of hydrogen into a ferroelectric layer of the ferroelectric memory
- Patent Title (中): 铁电存储器被配置为防止氢气渗入铁电存储器的铁电层
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Application No.: US11806618Application Date: 2007-06-01
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Publication No.: US07772629B2Publication Date: 2010-08-10
- Inventor: Shinichi Fukada
- Applicant: Shinichi Fukada
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2004-256043 20040902
- Main IPC: H01L27/108
- IPC: H01L27/108

Abstract:
To securely prevent hydrogen from entering a ferroelectric layer of a ferroelectric memory. A first hydrogen barrier layer 5 is formed on the lower side of ferroelectric capacitors 7. Upper surfaces and side surfaces of the ferroelectric capacitors 7 are covered by a second hydrogen barrier layer. All upper electrodes 7c of the plural ferroelectric capacitors 7 to be connected to a common plate line P are connected to one another by an upper wiring layer 91. The upper wiring layer 91 is connected to the plate line P through a lower wiring 32 provided below the ferroelectric capacitors 7. A third hydrogen barrier layer 92 is formed on the upper wiring layer 91 such that all edge sections 92a of the third hydrogen barrier layer 92 come in contact with the first hydrogen barrier layer 5.
Public/Granted literature
- US20070284637A1 Ferroelectric memory and its manufacturing method Public/Granted day:2007-12-13
Information query
IPC分类: