Invention Grant
US07772748B2 Composite for forming ferroelectric thin film, ferroelectric thin film, method of manufacturing ferroelectric thin film, and liquid-jet head 失效
用于形成铁电薄膜的复合材料,铁电薄膜,制造铁电薄膜的方法和液体喷射头

  • Patent Title: Composite for forming ferroelectric thin film, ferroelectric thin film, method of manufacturing ferroelectric thin film, and liquid-jet head
  • Patent Title (中): 用于形成铁电薄膜的复合材料,铁电薄膜,制造铁电薄膜的方法和液体喷射头
  • Application No.: US10590279
    Application Date: 2005-06-29
  • Publication No.: US07772748B2
    Publication Date: 2010-08-10
  • Inventor: Koji Sumi
  • Applicant: Koji Sumi
  • Applicant Address: JP Tokyo
  • Assignee: Seiko Epson Corporation
  • Current Assignee: Seiko Epson Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: Sughrue Mion, PLLC
  • Priority: JP2004-206225 20040713
  • International Application: PCT/JP2005/011996 WO 20050629
  • International Announcement: WO2006/006406 WO 20060119
  • Main IPC: H01L41/187
  • IPC: H01L41/187 C04B35/00 C23C16/40 B41K3/00
Composite for forming ferroelectric thin film, ferroelectric thin film, method of manufacturing ferroelectric thin film, and liquid-jet head
Abstract:
Provided are a composite for forming a ferroelectric thin film which is a colloidal solution applicable to the MOD method and capable of maintaining excellent dispersion stability and preservation stability of an organometallic compound over a long term, a ferroelectric thin film, a method of manufacturing a ferroelectric thin film, and a liquid-jet head. A composite for forming a ferroelectric thin film, which is made of a colloidal solution applicable to the MOD method containing an organometallic compound including metal constituting a ferroelectric thin film, and contains water other than water of crystallization in the organometallic compound is used when forming a ferroelectric thin film in accordance with the MOD method.
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