Invention Grant
- Patent Title: Composite for forming ferroelectric thin film, ferroelectric thin film, method of manufacturing ferroelectric thin film, and liquid-jet head
- Patent Title (中): 用于形成铁电薄膜的复合材料,铁电薄膜,制造铁电薄膜的方法和液体喷射头
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Application No.: US10590279Application Date: 2005-06-29
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Publication No.: US07772748B2Publication Date: 2010-08-10
- Inventor: Koji Sumi
- Applicant: Koji Sumi
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2004-206225 20040713
- International Application: PCT/JP2005/011996 WO 20050629
- International Announcement: WO2006/006406 WO 20060119
- Main IPC: H01L41/187
- IPC: H01L41/187 ; C04B35/00 ; C23C16/40 ; B41K3/00

Abstract:
Provided are a composite for forming a ferroelectric thin film which is a colloidal solution applicable to the MOD method and capable of maintaining excellent dispersion stability and preservation stability of an organometallic compound over a long term, a ferroelectric thin film, a method of manufacturing a ferroelectric thin film, and a liquid-jet head. A composite for forming a ferroelectric thin film, which is made of a colloidal solution applicable to the MOD method containing an organometallic compound including metal constituting a ferroelectric thin film, and contains water other than water of crystallization in the organometallic compound is used when forming a ferroelectric thin film in accordance with the MOD method.
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