Invention Grant
- Patent Title: Multilayer metamaterial isolator
- Patent Title (中): 多层超材料隔离器
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Application No.: US12286332Application Date: 2008-09-30
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Publication No.: US07773033B2Publication Date: 2010-08-10
- Inventor: Matthew A. Morton , Jiyun C. Imholt , Kevin Buell
- Applicant: Matthew A. Morton , Jiyun C. Imholt , Kevin Buell
- Applicant Address: US MA Waltham
- Assignee: Raytheon Company
- Current Assignee: Raytheon Company
- Current Assignee Address: US MA Waltham
- Agency: Iandiorio Teska & Coleman
- Main IPC: G01S7/28
- IPC: G01S7/28

Abstract:
A multilayer metamaterial isolator and method of fabricating the same. A first layer or surface of a multilayer dielectric substrate includes a first leg of a first resonator loop. A second layer or surface of the multilayer dielectric substrate includes a second leg of the first resonator loop. A third leg of the first resonator loop extends through the multilayer dielectric substrate interconnecting the first and second legs of the first resonator loop.
Public/Granted literature
- US20100079217A1 Multilayer metamaterial isolator Public/Granted day:2010-04-01
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