Invention Grant
- Patent Title: Methods and systems to compensate for a stitching disturbance of a printed pattern
- Patent Title (中): 用于补偿印刷图案的缝合干扰的方法和系统
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Application No.: US12000523Application Date: 2007-12-13
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Publication No.: US07773199B2Publication Date: 2010-08-10
- Inventor: Arno Bleeker , Wenceslao A. Cebuhar , Justin Kreuzer , Azat Latypov , Yuli Vladimirsky
- Applicant: Arno Bleeker , Wenceslao A. Cebuhar , Justin Kreuzer , Azat Latypov , Yuli Vladimirsky
- Applicant Address: NL Veldhoven
- Assignee: ASML Holding N.V.
- Current Assignee: ASML Holding N.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03B27/42
Abstract:
A method and system are provided of using a patterning device. An exemplary method includes defining a first region on a surface, the first region being associated with a first element of the patterning device, defining a second region on the surface, the second region being associated with a second element of the patterning device, activating the first element to expose the overlapping region, and deactivating the second element when the first element is active. The first region and the second region overlap in an overlapping region.
Public/Granted literature
- US20080094596A1 Methods and systems to compensate for a stitching disturbance of a printed pattern Public/Granted day:2008-04-24
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