Invention Grant
- Patent Title: Beam irradiation apparatus
- Patent Title (中): 光束照射装置
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Application No.: US12047038Application Date: 2008-03-12
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Publication No.: US07773277B2Publication Date: 2010-08-10
- Inventor: Atsushi Yamaguchi , Masato Yamada , Yoshiaki Maeno
- Applicant: Atsushi Yamaguchi , Masato Yamada , Yoshiaki Maeno
- Applicant Address: JP Osaka JP Tokyo
- Assignee: Sanyo Electric Co., Ltd,Sanyo Optec Design Co., Ltd.
- Current Assignee: Sanyo Electric Co., Ltd,Sanyo Optec Design Co., Ltd.
- Current Assignee Address: JP Osaka JP Tokyo
- Agency: Ditthavong, Mori & Steiner, P.C.
- Priority: JP2007-062924 20070313
- Main IPC: G02B26/08
- IPC: G02B26/08

Abstract:
A light refracting element formed in parallel plate shape is attached to a support shaft of a mirror holder, a semiconductor laser and a PSD are disposed at positions between which the light refracting element is sandwiched. The light refracting element is rotated by rotation of the mirror holder, and whereby a laser beam irradiation position is changed on a light acceptance surface of PSD. The laser beam irradiation position on a light acceptance surface corresponds to the mirror rotation position, so that the mirror rotation position and a laser beam scanning position in a target area can be detected based on an output from the PSD.
Public/Granted literature
- US20100073750A1 BEAM IRRADIATION APPARATUS Public/Granted day:2010-03-25
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