Invention Grant
- Patent Title: Modeling system, and modeling method and program
- Patent Title (中): 建模系统，建模方法和程序
-
Application No.: US11529660Application Date: 2006-09-28
-
Publication No.: US07773798B2Publication Date: 2010-08-10
- Inventor: Osamu Toyama , Toshio Norita
- Applicant: Osamu Toyama , Toshio Norita
- Applicant Address: JP Tokyo
- Assignee: Konica Minolta Holdings, Inc.
- Current Assignee: Konica Minolta Holdings, Inc.
- Current Assignee Address: JP Tokyo
- Agency: Sidley Austin LLP
- Priority: JP2005-290012 20051003
- Main IPC: G06K9/00
- IPC: G06K9/00
Abstract:
The present invention provides a modeling technique with improved modeling accuracy. A modeling system obtains a plurality of pieces of measurement data by measuring an object a plurality of times, and obtains a standard model as a standard three-dimensional model of the object. The modeling system deforms the standard model so as to optimize a predetermined evaluation function including an evaluation element on the plurality of pieces of measurement data, thereby generating a three-dimensional model of the object.
Public/Granted literature
- US20070075996A1 Modeling system, and modeling method and program Public/Granted day:2007-04-05
Information query
