Invention Grant
- Patent Title: Substrate processing method and storage medium having program stored therein
- Patent Title (中): 基板处理方法和存储有程序的存储介质
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Application No.: US11867421Application Date: 2007-10-04
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Publication No.: US07774082B2Publication Date: 2010-08-10
- Inventor: Shigeru Kubota , Shinji Sakano
- Applicant: Shigeru Kubota , Shinji Sakano
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-273793 20061005
- Main IPC: G06F19/00
- IPC: G06F19/00 ; G06F11/30 ; G21C17/00 ; C03C15/00 ; C03C25/68 ; C23F1/00

Abstract:
First feedforward calculation is executed when a preprocessing surface profile is measured and a processing chamber with its processing parameter value having been obtained through the first feedforward calculation judged to be within an allowable range is determined. Wafer transfer is executed only in conjunction with a processing chamber having a processing parameter value judged to be within the allowable range, and the wafer is carried to the entry point of the processing chamber. Then, second feedforward calculation is executed by reflecting the results of feedback calculation executed based upon the most recent processing having been executed in the particular processing chamber and wafer processing is executed in the processing chamber based upon the processing parameter value calculated in the second feedforward calculation.
Public/Granted literature
- US20080091290A1 SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM HAVING PROGRAM STORED THEREIN Public/Granted day:2008-04-17
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