Invention Grant
- Patent Title: Polishing composition for hard disk substrate
- Patent Title (中): 硬盘基材抛光组合物
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Application No.: US11642676Application Date: 2006-12-21
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Publication No.: US07780751B2Publication Date: 2010-08-24
- Inventor: Shigeo Fujii , Kenichi Suenaga
- Applicant: Shigeo Fujii , Kenichi Suenaga
- Applicant Address: JP Tokyo
- Assignee: KAO Corporation
- Current Assignee: KAO Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2005-370535 20051222; JP2005-373088 20051226
- Main IPC: C09C1/68
- IPC: C09C1/68 ; C09K3/14 ; B24D3/02

Abstract:
The present invention preferably provides a polishing composition for a hard disk substrate, containing aluminum oxide particles and water, wherein secondary particles of the aluminum oxide particles have a volume-median particle size of from 0.1 to 0.7 μm, and particles having particle sizes of 1 μm or more of the aluminum oxide particles are contained in an amount of 0.2% by weight or less of the polishing composition; and a method for manufacturing a hard disk substrate using the polishing composition. By using the polishing composition and the method for manufacturing a substrate of the present invention, for example, a hard disk substrate suitable for high recording density can be provided in high productivity.
Public/Granted literature
- US20070149097A1 Polishing composition for hard disk substrate Public/Granted day:2007-06-28
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